System: hydrogen sulfide (H2S)/silicic acid (H4SiO4) tetraethyl ester
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| 1) hydrogen sulfide (H2S) |
| DECHEMA ID | 41326 |
| Formula | H2S |
| Synonym | hydrogen sulphide |
| Synonym | hydrosulfuric acid |
| Synonym | sulfur dihydride |
| Synonym | sulfuretted hydrogen |
| Synonym | hydrogen sulfide |
| Synonym | sulfur hydride |
| Synonym | dihydrogen sulfide |
| Synonym | stink damp |
| InChi-Key | RWSOTUBLDIXVET-UHFFFAOYSA-N |
| Registry No. | 7783-06-4 |
| 2) silicic acid (H4SiO4) tetraethyl ester |
| DECHEMA ID | 41597 |
| Formula | C8H20O4Si |
| Synonym | ethyl orthosilicate |
| Synonym | tetraethoxysilane |
| Synonym | silicon ethoxide |
| Synonym | dynasil |
| Synonym | tetraethoxysilylmethane |
| Synonym | tetraethyl silicate |
| Synonym | silane, tetraethoxy- |
| Synonym | tetraethyl orthosilicate |
| Synonym | z-6697 |
| Synonym | si(oet)4 |
| Synonym | silicic acid tetraethyl ester |
| Synonym | tetraethoxysilicon |
| Synonym | ethyl silicate |
| Synonym | silicon tetraethoxide |
| Synonym | teos |
| InChi-Key | BOTDANWDWHJENH-UHFFFAOYSA-N |
| Registry No. | 78-10-4 |
Available physical property data:
| Property | Phase | No. of tables | No. of lines | Data |
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| Ostwald adsorption coefficient | - | 1 | 6 | View |
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